In this section
@article{Campbell:2016:10.1016/j.memsci.2016.01.024,
author = {Campbell, J and Burgal, JDS and Szekely, G and Davies, RP and Braddock, DC and Livingston, A},
doi = {10.1016/j.memsci.2016.01.024},
journal = {Journal of Membrane Science},
pages = {166--176},
title = {Hybrid polymer/MOF membranes for Organic Solvent Nanofiltration (OSN): chemical modification and the quest for perfection},
url = {http://dx.doi.org/10.1016/j.memsci.2016.01.024},
volume = {503},
year = {2016}
}
TY - JOUR
AB - One of the main challenges in the field of Organic Solvent Nanofiltration (OSN) is to improve the selectivity of membranes, allowing the separation of closely related solutes. This objective might be achieved by constructing membranes with uniform porous structures. Hybrid Polymer/Metal Organic Framework (MOF) membranes were prepared by in-situ growth (ISG) of HKUST-1 within the pores of polyimide membranes. To improve the performances of ISG membranes, chemical modification was performed. Aryl carboxylic acid moieties were introduced to polyimide P84 ultrafiltration membranes allowing coordination of the HKUST-1 directly on to the polymer. Chemically modified ISG membranes outperformed non-modified ISG membranes in both solute retentions and permeance. Retentions of polystyrene solute in acetone were used to calculate theoretical pore size distributions for each of the membranes tested. It was found that the chemically modified ISG membrane had he narrowest calculated pore size distribution.
AU - Campbell,J
AU - Burgal,JDS
AU - Szekely,G
AU - Davies,RP
AU - Braddock,DC
AU - Livingston,A
DO - 10.1016/j.memsci.2016.01.024
EP - 176
PY - 2016///
SN - 1873-3123
SP - 166
TI - Hybrid polymer/MOF membranes for Organic Solvent Nanofiltration (OSN): chemical modification and the quest for perfection
T2 - Journal of Membrane Science
UR - http://dx.doi.org/10.1016/j.memsci.2016.01.024
UR - http://gateway.webofknowledge.com/gateway/Gateway.cgi?GWVersion=2&SrcApp=PARTNER_APP&SrcAuth=LinksAMR&KeyUT=WOS:000369494100019&DestLinkType=FullRecord&DestApp=ALL_WOS&UsrCustomerID=1ba7043ffcc86c417c072aa74d649202
UR - http://hdl.handle.net/10044/1/34570
VL - 503
ER -