Polymers

Spin-Coater

Location: Clean Room Yellow Room Photolithography Suite

SUSS MicroTec‘s LabSpin platform represents the next generation of manual spin coater and developer systems that have been developed specifically for laboratory and R&D. Designed for various photolithography chemicals, LabSpin systems provide uniform, precise and repeatable spin coating results on the wafer through its advanced process chamber design.

The LabSpin is available in various versions, such as a tabletop and built-in unit. Built-in platforms are designed for integration into a wet bench and a glove box or are used in the SUSS LabCluster. LabSpin6 is suitable for round substrates up to 150 mm in diameter or square substrates up to 100x100 mm. LabSpin8 is suitable for round substrates up to 200 mm in diameter or square substrates up to 150x150 mm. With a wide range of substrate holders, even fragments and unique shapes can be processed without problems. The LabSpin platform is characterised by a compact, space-saving design and requires little clean room space.

The large variety of LabSpin options allows a very wide range of applications. Coatings can be applied manually with syringes, semi-automatically with cartridges or with up to two fully automatic dispensing systems. In addition to edge coating, edge bead removal and puddle development, further options are available.